Pure Silicon TEM Windows feature imaging windows with 5 to 15 nm thickness, reducing background contribution and interference for higher contrast imaging. The membrane can be vigorously plasma cleaned to remove organic contamination, unlike traditional carbon grids. The elemental silicon composition of TEM Windows remarkably increases stability at high beam currents and at high annealing temperatures. With a minimal background signal, elemental analyses of samples containing nitrogen and/or carbon is possible by EDX and EELS. Nanoporous with pores from 10-60nm.
Dimensions: 25 µm
Thickness: 5 nm